高频溅射技术原理是在真空中充以惰性气体氩 ,在高压电场的作用下 ,氩气电离使阴极与阳极间产生辉光放电 ,经磁场作用增强等离子体并被电场加速成高能离子流 ,撞击到阴极靶材上 ,使靶材逐渐地、缓慢地“溃散” ,以原子或原子团甚至以剩余气体分子、化学结合物形成脱离靶材 ,淀 High-frequency sputtering technology principle is filled with argon in a vacuum inert gas, under the action of a high-voltage electric field, argon ionization produces glow discharge between the cathode and the anode, the plasma enhanced by the magnetic field and is accelerated by the electric field into a high-energy ion current , Hit the cathode target, the target gradually, slowly “collapse” to atoms or atomic groups and even the remaining gas molecules, the formation of chemical conjugates off the target, the lake