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本文介绍了两种类型无截获栅控枪(即:单一栅和四极管型无截获栅控枪)的工艺结构设计。给出了阴栅结构设计的基本方法以及阴极几何利用系数的计算方法,从而合理地确定了最佳的网孔数、网孔尺寸和网筋宽度。本文还介绍了阴栅组件的加工方法、对栅方法。讨论了电子枪中的击穿现象。
This article describes the process structure design of two types of non-intercepted Gated guns (ie, Single Gates and Tetra-type Gapless Gated Gates). The basic design method of the grid structure and the calculation method of the cathode geometrical utilization factor are given, which can reasonably determine the optimal mesh number, mesh size and mesh width. This article also describes the processing method of the grid components, the gate method. Breakdown in electron guns is discussed.