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近年来,随着现代化社会发展水平的不断提高以及科学技术的进步发展,电子材料的表面抛光技术得到较快发展。但是,随着电子材料种类的不断增多,以及电子材料表面抛光技术难度系数的增高,表面抛光技术中化学与机械的优化平衡正在面临较大挑战。因此,电子材料的表面抛光工作中,要采用科学的技术管理方法促进抛光技术中化学以及机械的优化平衡。本文就电子材料表面抛光中化学以及机械的平衡展开论述,并提出合理化优化对策。
In recent years, with the continuous development of modern society and the progress of science and technology, surface polishing technology for electronic materials has been rapidly developed. However, with the increasing types of electronic materials and the increasing difficulty of the surface polishing of electronic materials, the optimization of the chemical and mechanical balance in the surface polishing technology is facing great challenges. Therefore, the surface of electronic materials, polishing work, the use of scientific and technical management methods to promote polishing technology optimization of the chemical and mechanical balance. This article discusses the chemical and mechanical balance of surface polishing of electronic materials, and puts forward the rationalization and optimization measures.