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研究光学介质薄膜横断面,是剖析膜层内部细微结构变化的重要手段。光学介质薄膜的厚度,多层膜厚达几万埃,而单层膜厚只有二千埃左右,要用电镜观察这样厚度试样横断面的细微结构,样品制备技术难度较大。下面简要地叙述样品制备的过程及要点。一级复型法蒸镀前的工作:断面的制取:将镀有介质膜的一面放在擦镜纸上(保护膜层),在没有膜的一面用玻璃刀划一道线,用二把钳子分别夹在划线的二边
Study of optical media film cross-section, is an important means to analyze the microstructure changes within the film. Optical media film thickness, multilayer film thickness of tens of thousands of angstroms, while the single film thickness of only about two thousand angstroms, electron microscopy to observe the thickness of the sample cross-section of the fine structure, sample preparation technology is more difficult. The following briefly describes the sample preparation process and points. A complex stereotypes before the work of vapor deposition: Preparation of the cross-section: Placed with a dielectric film on one side of the lens paper (protective film), the side without a glass with a glass knife to draw a line with two Pliers were caught in the crossed two sides