在《科学通报》的“综合评述”栏目中，王占山等指出，极紫外光刻最有可能成为下世纪初批量生产线宽小于０·１ｍ集成电路的技术，近年来得到了飞速发展，备受世界各国，尤其是美国和日本两个集成电路生产大国的密切关注。０．１ｍ线宽门电路研制成功表明，极紫外光刻技术适合 Wang Zhaoshan et al. Pointed out in the “Comprehensive Review” section of Science Bulletin that EUV lithography is most likely to be the technology to mass-produce integrated circuits with a linewidth of less than 0.1 m at the beginning of the next century and has been rapidly developed in recent years. , Especially the close attention of the two major integrated circuit producing countries in the United States and Japan. The successful development of 0.1m line width gate shows that EUV lithography is suitable