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用椭圆偏振法研究了镍在硼酸盐缓冲溶液中,于初始钝化处(-0.5V,SCE)、稳定钝化处(0.4V)和钝化/过钝化交界处(0.8V)恒电位阳极极化时所生成的钝化膜。分析了钝化膜的厚度、生长动力学规律、成份和生长机理。结果表明:钝化膜的厚度、成份和生长机理都与外加电位有关;在所研究的电位下,钝化膜都具有双层结构;膜生长都先生成外层膜,随后在其下面再生成一层内层膜;内层膜的生长都服从线性规律,外层膜的生长规律分别为线性规律、抛物线规律和对数规律。
The effects of nickel on the initial passivation (-0.5V, SCE), steady passivation (0.4V) and passivation / passivation (0.8V) constant were studied by ellipsometry in a borate buffer solution. Passivation film generated when the anode is polarized. Passivation film thickness, growth kinetics, composition and growth mechanism were analyzed. The results show that the thickness, composition and growth mechanism of the passivation film are all related to the applied potential. At the potential studied, the passivation film has a double-layer structure, the film grows into an outer film and then a In the inner layer, the growth of the inner layer obeys the linear rule, and the growth law of the outer layer is linear law, parabola law and logarithmic law.