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采用磁控溅射沉积技术在贫铀上镀铝膜,利用X射线衍射原位研究了铝镀层与贫铀基体的界面反应,分析了界面反应产物随温度和时间的变化规律。实验结果显示,镀膜过程Al/U界面没有化合物形成,而在较高温度下(≥335℃)两相界面会发生反应并形成金属间化合物UAl_3相,反应动力学符合形核-生长机制。形成的UAl_3相为疏松的层状结构,且相应的衍射峰强度随温度的升高而逐渐降低,直至消失,文中对该现象的原因进行了分析和讨论。
Magnetron Sputtering deposition technique was used to deposit aluminum on depleted uranium. The interfacial reaction between aluminum coating and depleted uranium matrix was investigated by X-ray diffraction. The variation of interfacial reaction products with temperature and time was analyzed. The experimental results show that there is no compound formed on the Al / U interface during the coating process, but the reaction occurs at the interface of the two phases at higher temperature (≥335 ℃) and forms the intermetallic compound UAl_3 phase. The reaction kinetics conforms to the nucleation-growth mechanism. The formed UAl_3 phase is a loose layered structure, and the corresponding diffraction peak intensity decreases with increasing temperature until it disappears. The reason of this phenomenon is analyzed and discussed in this paper.