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采用磁控溅射和离子镀膜工艺在Mo基片上制备了具有不同晶粒尺寸的纯Ti薄膜 ,并利用X光衍射 (XRD)、透射电镜 (TEM )和扫描电镜 (SEM )分析和观察了两类Ti膜的结构和形貌。实验结果显示 :与溅射镀膜相比 ,离子镀膜的晶粒择优取向程度略低 ,Ti膜与基片结合较好 ;较高的基片温度有利于提高膜的致密程度 ,并降低膜的晶粒择优取向程序。
Pure Ti films with different grain sizes were prepared on the Mo substrate by magnetron sputtering and ion-plating process. The pure Ti films with different grain sizes were prepared and characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM) and scanning electron microscopy (SEM) Structure and Morphology of Ti-Like Films. The experimental results show that: compared with the sputter coating, the preferred orientation of the grain is slightly lower, the combination of the Ti film and the substrate is better; the higher substrate temperature is beneficial to improve the density of the film and reduce the film crystal Grain preferred orientation program.