论文部分内容阅读
简述了电子束曝光技术及电子束抗蚀剂在微电子器件制造中的重要性,着重介绍了电子束正性抗蚀剂P(MMA-MAA)的研制过程及为使之达到实用化所进行的各项研究及其结果和应用情况。
The importance of electron beam lithography and electron beam resist in the manufacture of microelectronic devices are briefly described. The development process of electron beam positive resist P (MMA-MAA) and its practical application Various studies carried out and their results and application.