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根据全方位等离子体源离子注入(PSII)工业样机实验和应用的需要,用等效电流磁场计算法获得的数据结果,设计了一种子面磁控溅射靶。并利用此平面磁控靶在一定的Ar、N_2气体分压及不同电流、电压条件下,成功地制备出金黄色氮化钛薄膜,并利用台阶轮廓仪测量了TiN薄膜的沉积速率,这表明该靶的沉积速率能满足增强沉积TiN涂层的需要。 在现代工业的许多领域中,已认识到提高材料的耐磨损、耐腐蚀的必要性和迫切性,而对材料表面进行改性是提高材料性能的最有效和经济的手段。离子注入技术作为金属材料表面性能改善的有效手段,愈来愈受到人们的关注。特别是近年来发展的全
According to the requirements of the experiments and applications of the industrial prototype of the plasma source ion implantation (PSII), a subsurface magnetron sputtering target was designed based on the data obtained by the equivalent current magnetic field calculation. The gold-colored titanium nitride film was successfully prepared under certain Ar, N2 gas partial pressure and different current and voltage conditions by using the planar magnetron target. The deposition rate of the TiN film was measured by a step profiler, The target deposition rate can meet the need to enhance the deposition of TiN coatings. In many fields of modern industry, the necessity and urgency of improving wear and corrosion resistance of materials have been recognized, and modification of the surface of materials is the most effective and economical means of improving material properties. Ion implantation technology as an effective means of improving the surface properties of metal materials, more and more people’s attention. In particular, the development of all in recent years