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采用熔盐电沉积法制备了Ni/W复合层,通过扫描电镜,辉光放电光谱仪和电子背散射衍射技术对Ni/W复合层的微观结构、复合层厚度、晶粒尺寸及小角度晶界频率进行了表征。结果表明,Ni/W复合层的断裂方式为解理断裂;当电沉积温度为1073 K时,Ni/W复合层的表面平整光滑,晶粒尺寸大小均匀;随电沉积温度升高,复合层厚度逐渐增加,Ni在钨板中的扩散系数增大,小角度晶界频率增加。
The Ni / W composite layer was prepared by molten salt electrodeposition. The microstructure, composite layer thickness, grain size and small angle grain boundaries of Ni / W composite layer were characterized by scanning electron microscopy, glow discharge spectroscopy and electron backscatter diffraction Frequency was characterized. The results show that the fracture mode of Ni / W composite layer is cleavage fracture. When the electrodeposition temperature is 1073 K, the surface of Ni / W composite layer is smooth and the grain size is uniform. With the increase of electrodeposition temperature, the composite layer The thickness gradually increases, the diffusion coefficient of Ni in the tungsten plate increases, and the frequency of the small-angle grain boundaries increases.