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微波等离子体化学气相沉积(MPCVD)法是目前最有发展前景的高质量金刚石薄膜沉积方法之一,但由于谐振腔中微波与等离子体之间强烈的相互作用,人们很难根据经验对谐振腔进行改进,本文利用HFSS软件对不锈钢式MPCVD的谐振腔进行了模拟,通过分析谐振腔内电场以及等离子体的分布,对谐振腔的主要参数进行了优化处理,并根据模拟结果设计出谐振腔系统,在一定条件下,沉积出了优质的金刚石膜,沉积速率可达到0.33μm/h。
The microwave plasma chemical vapor deposition (MPCVD) method is one of the most promising methods for depositing high quality diamond thin films. However, due to the strong interaction between the microwave and the plasma in the cavity, it is difficult to empirically evaluate the cavity In this paper, the HFSS software was used to simulate the cavity of stainless steel MPCVD. The main parameters of the resonator were optimized by analyzing the electric field in the cavity and the plasma distribution. Based on the simulation results, the resonant cavity system , Under certain conditions, deposited a high-quality diamond film, deposition rate can reach 0.33μm / h.