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采用直流磁控溅射(DMS)和能量过滤磁控溅射(EFMS)技术在玻璃衬底上制备TiO_2薄膜。利用扫描电子显微镜、X射线衍射、椭圆偏振光谱仪等对薄膜的性能进行表征和分析。结果表明EFMS技术制备的TiO_2薄膜在较大面积上结晶性能以及光学性能的均一性均得到改善。
TiO 2 thin films were prepared on glass substrates by direct current magnetron sputtering (DMS) and energy-filtration magnetron sputtering (EFMS). The properties of the films were characterized and analyzed by scanning electron microscopy, X-ray diffraction and ellipsometry. The results show that both the crystallinity and the homogeneity of the optical properties of the TiO 2 thin films prepared by EFMS are improved.