CPU和显示芯片工作频率的不断提升,都离不开半导体技术的发展,其中半导体制造工艺的发展是一个相当重要的环节。从1995年以来,芯片制造工艺的发展十分迅速,先后从0.5微米、0.35微米、0.25微米、0.18微米一直发展到目前的0.13微米,而新一代的0.09微米工艺也已初显端倪。要知道,1微米相当于1/60头发丝直径的大小,0.09微米(90纳米)又是什么概念。别看它们之间的差距非常小,实质上技术已发生根本的变化。 The continuous improvement of the working frequency of the CPU and the display chip can not be separated from the development of the semiconductor technology. The development of the semiconductor manufacturing process is a very important link. Since 1995, the chip manufacturing process has developed rapidly, from 0.5 microns, 0.35 microns, 0.25 microns, 0.18 microns has been developed to the current 0.13 microns, and a new generation of 0.09 microns process has also begun to emerge. To know, 1 micron equivalent to 1/60 hair diameter size, 0.09 microns (90 nm) is what the concept. Do not look at the gap between them is very small, in fact, the fundamental changes have taken place.