论文部分内容阅读
采用短波长光源，制作小于０．５μｍ线宽的ＶＬＳＩ芯片，对准精度必须是０．１μｍ甚至更小。该报告介绍掩模对准台在机械方面的改进，诸如Ｘ、Ｙ向位移精度的提高，Ｚ向精度的实现和俯仰运动的控制。典型样机和高精密对准台已经生产出来。为了提高Ｘ、Ｙ向位移精度，工作台采用阻尼驱动机构，且采用一种线性模拟／数字游标信号的测量方法。实验结果从Ｘ－Ｙ工作台获得小于０．０２５μｍ的位移分辨率，无间隙，无滑行，且无滞后现象。
The use of short-wavelength light source, the production of less than 0.5μm VLSI chip width, alignment accuracy must be 0.1μm or less. The report describes the mechanical aspects of mask alignment stages such as X, Y direction displacement accuracy improvement, Z direction accuracy and pitching control. Typical prototypes and high-precision alignment stations have been produced. In order to improve the displacement accuracy of X and Y directions, the worktable adopts the damping drive mechanism, and adopts a kind of linear analog / digital cursor signal measurement method. The experimental results obtained from the X-Y table displacement resolution of less than 0.025μm, no gap, no glide, and no hysteresis.