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叙述了采用氩离子束刻蚀的方法制作线列长方形拱面石英微透镜阵列．所制单元石英微透镜底部的外形尺寸为（300×106）um2，平均冠高7．07μm，平均曲率半径202．19μm，平均焦距404．38μm，平均F2数为3．82，平均光焦度2．47×103屈光度，扫描电子显微镜和表面探针测试表明，所制线列石英微透镜阵列的图形整齐均匀，单元长方形拱面石英微透镜的轮廓清晰，表面光滑平整．所制微透镜阵列用于高Tc超导红外探测器阵列的实验证实，微透镜的引入可以显著改善超导探测器的光响应特性．
Describes the use of argon ion beam etching method for the production of rectangular columnar array of quartz microlens array. The outer dimensions of the bottom of the unit made of fused silica are (300 × 106) um2, the average crown height is 7.07μm, the average radius of curvature is 202.19μm, the average focal length is 404.38μm, the average F2 number is 3.82, the average optical power 2.47 × 103 diopters, scanning electron microscopy and surface probe test showed that the line array of quartz micro-lens array of uniform and neat, rectangular outline of the unit cell surface of the quartz micro-lens clear outline, smooth surface. The fabricated microlens array is used in the experiments of high Tc superconducting infrared detector array. The introduction of microlens can significantly improve the light response characteristics of the superconducting detector.