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采用脉冲激光沉积法(PLD)在不同激光通量下烧蚀CNx靶,在单晶硅基底上沉积CNx薄膜。利用扫描电子显微镜(SEM)、X射线能谱仪(EDS)、X射线光电子谱仪(XPS)等对薄膜的形貌、化学成分和微观结构进行了表征。采用球-盘式磨损试验机在大气(相对湿度48%～54%)环境下测试了薄膜的摩擦学特性。结果表明,递进式PLD技术可显著提高CNx薄膜的含氮量。当激光通量从5.0J/cm2提高至10.0J/cm2时,薄膜含氮原子数分数由23.8%上升至29.9%,膜中N-sp2 C键的含量上升,N-sp3 C键和sp3 C-C键的含量下降,薄膜的磨损率从2.1×10-15 m3/(N.m)上升至9.0×10-15 m3/(N.m)。摩擦系数为0.15～0.23,激光通量5.0J/cm2沉积的薄膜有最佳摩擦学性能。
The CNx target was ablated with different laser fluxes by pulsed laser deposition (PLD), and CNx thin films were deposited on monocrystalline silicon substrates. The morphology, chemical composition and microstructure of the films were characterized by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) The ball-disc wear tester was used to test the tribological properties of the films in the atmosphere (relative humidity 48% ~ 54%). The results show that the progressive PLD technology can significantly improve the CNx film nitrogen content. When the laser flux increased from 5.0 J / cm2 to 10.0 J / cm2, the content of nitrogen atom in the film increased from 23.8% to 29.9%, and the content of N-sp2 C bond in the film increased. The N-sp3 C bond and sp3 CC Bond content decreased, the wear rate of the film increased from 2.1 × 10-15 m3 / (Nm) to 9.0 × 10-15 m3 / (Nm). The friction coefficient of 0.15 ~ 0.23, laser flux 5.0J / cm2 deposition of the film has the best tribological properties.