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一、微电子学发展的需要随着微电子器件、电路和系统的设计理论和工艺制备技术的发展,目前,在微电子技术某些方面,已面临着一种必须依靠低温才能解决问题的趋势.低温微电子学单独作为一学科发展方向问世,主要由以下几方面的因素促成:1.过去二十年来,集成电路的集成度每十年增加100倍,目前代表性产品是兆位动态随机存储器,集成度达到每芯片数百万个元件.由于CMOS电路独特的低功耗,高抗干扰能力等特点,已成为八十年代超大规模集成电路的主流工艺和技术.集成度的不断提高和器件尺寸的不断减小,正向其极限逼近.到九十年代初期,光学图形转移技术将会达到极限:
I. THE NEED OF MICROELECTRONICS DEVELOPMENT With the development of microelectronic devices, circuits and system design theory and process technology, at present, in some aspects of microelectronic technology, it has been faced with a tendency to rely on low temperature to solve the problem . Cryogenic microelectronics as a separate discipline as the advent of development, mainly by the following factors: 1. Over the past two decades, integrated circuit integration increased 100 times every 10 years, the current representative products are megabit dynamic random Memory, integration of millions of components per chip due to CMOS circuits unique low-power, high anti-interference ability and other characteristics, has become the eighties super large-scale integrated circuits of mainstream technology and technology. The continuous improvement of integration and Device size continues to decline, is approaching its limit to the early 90s, optical graphics transfer technology will reach the limit: