论文部分内容阅读
离子源是离子注入设备的重要组成部分,其控制方式,工作频率以及产生离子的种类、电流强度、离子束密度等对离子注入设备的运行效率和稳定性有着重大影响。本文主要论述了一套应用于MEVVA型金属离子源的脉冲弧电源的设计与优化。该电源由触发电源和电弧电源组成,其中触发电源输出峰值电压高达25KV,脉宽为20us;电弧电源输出峰值电压为90V,输出脉宽在200us~3ms范围内可调。该电源采用DSP-28335芯片作为控制系统,输出PWM信号准确控制IGBT的开通关断,从而控制输出脉冲的电压,频率和脉宽;实时监控过压过流信号,保护电源系统安全可靠运行。实验结果表明:此电源各项指标运行正常,电磁干扰小,具有良好的应用价值。
Ion source is an important part of ion implantation equipment. The control method, working frequency and the kinds of ions, current intensity and ion beam density have great influence on the operation efficiency and stability of ion implantation equipment. This paper mainly discusses the design and optimization of a pulse arc power source for MEVVA metal ion source. The power supply consists of a triggering power supply and an arc power supply. The peak voltage of the triggering power supply is up to 25KV and the pulse width is 20us. The peak output voltage of the arc power supply is 90V, and the output pulse width is adjustable from 200us to 3ms. The power supply adopts DSP-28335 chip as the control system and outputs PWM signal to control IGBT on and off accurately so as to control the voltage, frequency and pulse width of the output pulse. The overvoltage and over-current signal is monitored in real time to protect the power system from running safely and reliably. The experimental results show that: The indicators of this power supply are running normally, the electromagnetic interference is small, and has good application value.