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采用射频磁控溅射制备不同W含量的CrSiWN薄膜。利用X射线衍射、扫描电镜、能量散射谱、纳米压痕仪和摩擦磨损实验机对薄膜的相结构、形貌、成分和摩擦性能进行分析。结果表明,CrSiWN薄膜为fcc结构,具有(111)择优取向,薄膜主要为W固溶在CrSiN薄膜中的置换固溶体。随W含量的升高,薄膜晶格常数及晶粒尺寸逐渐增大,抵抗塑性变形能力(H3/E2)逐渐降低。由于固溶强化和晶粒增大的共同作用,薄膜显微硬度随W含量的增加先升高后降低。由于薄膜抵抗塑性变形能力随W含量逐渐降低,导致薄膜平均摩擦系数逐渐增高。当W含量为13.20%时,薄膜综合性能最优。
CrSiWN films with different W contents were prepared by RF magnetron sputtering. The phase structure, morphology, composition and tribological properties of the films were analyzed by X-ray diffraction, scanning electron microscopy, energy dispersive spectroscopy, nanoindentation and friction and wear testing machine. The results show that the CrSiWN film has a fcc structure and has a preferred orientation of (111). The film is mainly composed of a substitutional solid solution of W dissolved in a CrSiN film. With the increase of W content, the lattice constant and grain size gradually increase, and the resistance to plastic deformation (H3 / E2) decreases gradually. Due to the combined effect of solid solution strengthening and grain growth, the microhardness of the film first increases and then decreases with the increase of W content. As the film resistance to plastic deformation with the W content gradually decreased, resulting in an average film friction coefficient increased gradually. When W content is 13.20%, the film has the best overall performance.