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少量氧化钡对钢化玻璃绝缘子降低熔融温度,提高电气性能极为重要。因此,要求测定氧化钡的方法必须准确可靠,目前,已有铬酸钡容量法,硫酸钡重量法,火焰原子吸收法及火焰光度法。铬酸钡容量法和硫酸钡重量法手续冗长,费时费工。空气-乙炔火焰原子吸收法灵敏度较低。而笑气-乙炔火焰原子吸收法比较快速准确,但未能普及。为此,我们将火焰分子发射测定半导体釉中氧化钡的方法推广至玻璃中氧化钡的测定,效果颇佳。钙、钠和钾等金属元素对于氧化钡在波长376纳米处的分子发射峰有严重干扰。在半导体釉中由于这三种金属元素含量甚少,其干扰可不考虑。然而对于钙、钠和钾含量较多的玻璃样品中氧化钡的测定干扰
A small amount of barium oxide on the glass insulator to reduce the melting temperature, improve electrical performance is extremely important. Therefore, the method of determination of barium oxide must be accurate and reliable. At present, barium chromate volumetric method, barium sulfate gravimetric method, flame atomic absorption spectrometry and flame photometry are available. Barium chromate capacity method and barium sulfate gravimetric procedures lengthy, time-consuming and laborious. Air - acetylene flame atomic absorption method with low sensitivity. The naughty - acetylene flame atomic absorption method more rapid and accurate, but failed to universal. To this end, we will fire molecular emission measurement of semiconductor glaze barium oxide method to promote the determination of barium in glass, the effect is quite good. Metallic elements such as calcium, sodium and potassium have serious interference with the molecular emission peak of barium oxide at a wavelength of 376 nm. In the semiconductor glaze because these three metal elements content is very small, the interference may not be considered. However, the determination of barium oxide in glass samples with more calcium, sodium and potassium content interferes with the determination