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Multilayered ZrAlN/ZrB2 coatings containing alternating bilayer periods were synthesized by dc magnetron sputtering technique. The intensities of ZrN (111) or ZrN (200) textures in the structure of the nanolayers depended on the bilayer period as well as N2 gas partial pressure during deposition. Nanoindentation testing showed that hardness and internal stress of the nanolayers varied with the bilayer period and crystallographic orientation in the coatings. The hardness of the nanolayers with bilayer periods of 3~6 nm was enhanced (~27%) over the rule-of-mixture value. A low percent of N2 in processing gas was proved to be benefitial to the synthesis of high hard nanoscale multilayered coatings.
The intensities of ZrN (111) or ZrN (200) textures in the structure of the nanolayers depended on the bilayer period as well as N2 gas partial pressure during deposition . Nanoindentation testing showed that hardness and internal stress of the nanolayers varied with the bilayer period and crystallographic orientation in the coatings. The hardness of the nanolayers with bilayer periods of 3 ~ 6 nm was enhanced (~ 27%) over the rule-of- mixture value. A low percent of N2 in processing gas was proved to be benefitial to the synthesis of high hard nanoscale multilayered coatings.