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利用射频磁控溅射方法以纯金属钛做靶材在氩氧混合气体中制备了TiO2薄膜.X射线衍射结果表明,在NiMnCo合金基底上成功地沉积了具有金红石、金红石/锐钛矿和锐钛矿结构的TiO2薄膜,工作气压从0.2Pa变化到2Pa,TiO2薄膜的结构由金红石相变到锐钛矿相.低于600nm时,厚度对TiO2薄膜结构没有明显影响.
TiO2 thin films were prepared by RF magnetron sputtering using pure titanium as the target in argon-oxygen mixed gas.The results of X-ray diffraction showed that the films with rutile, rutile / anatase and anatase were successfully deposited on the NiMnCo alloy substrate. The structure of TiO2 film changes from rutile phase to anatase phase when the operating pressure changes from 0.2Pa to 2Pa. The thickness of TiO2 film has no significant effect on the structure of TiO2 film.