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运用射频磁控溅射技术在Si(100)基片及40Cr钢基体上制备了调制周期λ=60 nm,调制比η=0.25~3的Al/A12O3纳米多层膜。通过X射线衍射、X射线光电子能谱、扫描电镜、原子力显微镜、维氏显微硬度仪及MFT-4000多功能材料表面性能测试仪对多层膜的结构、硬度、膜基结合强度及摩擦性能进行了研究。结果表明:Al/A12O3多层膜中Al层呈现(111)择优取向,A12O3层以非晶形式存在,多层膜呈现良好的调制结构。薄膜与衬底之间的结合强度较高,均在40 N左右,摩擦系数均低于衬底的摩擦系数,表明Al/A12O3多层膜具有一定的减摩作用。η=0.25的Al/A12O3多层膜具有最高的硬度值(16.1GPa),摩擦系数最低(0.21),耐磨性能最好。
The Al / Al 2O 3 nano-multilayer with modulation period λ = 60 nm and modulation ratio η = 0.25 ~ 3 was prepared on Si (100) substrate and 40Cr steel substrate by RF magnetron sputtering. The structure, hardness, film-based bond strength and tribological properties of multilayer films were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy, Vickers microhardness tester and MFT-4000 multifunctional material surface properties tester Were studied. The results show that the Al layer in the Al / A12O3 multilayer exhibits a (111) preferred orientation and the A12O3 layer exists in an amorphous form. The multilayer film exhibits a good modulation structure. The bonding strength between the film and the substrate is high, about 40 N, and the friction coefficient is lower than that of the substrate, indicating that the Al / A12O3 multilayer film has certain anti-friction effect. The η = 0.25 Al / A12O3 multilayers have the highest hardness (16.1 GPa), the lowest friction coefficient (0.21) and the best wear resistance.