二氧化铈具有高折射率、介电常数和紫外吸收率,因此它广泛地应用于各种光学和电子器件。本文采用射频磁控溅射法在玻璃基片上沉积CeO2薄膜。溅射过程中,首先制备纯二氧化铈靶材,然后在不同的功率上调节不同的基片温度进行溅射。采用光电子能谱、X射线衍射、拉曼光谱和扫描电镜等测试方法表征薄膜的特性。 Ceria has a high refractive index, a dielectric constant and an ultraviolet absorptivity, so it is widely used in various optical and electronic devices. In this paper, a radio frequency magnetron sputtering method was used to deposit CeO2 film on a glass substrate. In the sputtering process, pure ceria targets are prepared first, and then different substrate temperatures are adjusted for sputtering at different powers. The properties of thin films were characterized by the methods of photoelectron spectroscopy, X-ray diffraction, Raman spectroscopy and scanning electron microscopy.