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“要使X射线曝光工艺获得成功,需要解决的关键问题有X射线源、掩模、掩模与晶片的对准、抗蚀剂、掩模的检查修正等几项工作”。本文介绍一下1984年以来日本公布的专利中有关X射线掩模的进展概况。X射线用的掩模由X射线透射层、X射线吸收体与支撑吸收体的支撑体组成。现在没有定论说氮化硼(BN)和氮化硅(SiN)作为X射线透射层的材料最好,也没有定论说金(Au)作为X射线吸收体最好,有关X射线掩模的材料问题最近提出了各种方案,预料支撑体将采用单晶硅。
“The key issues that need to be addressed are the X-ray source, the mask, the alignment of the mask and the wafer, the inspection and correction of the resist, the mask, etc. for the X-ray exposure process to be successful.” This article presents an overview of the progress made with X-ray masks in a patent published in Japan since 1984. The mask for X-ray consists of an X-ray transparent layer, an X-ray absorber, and a support body which supports an absorber. It is now inconclusive that boron nitride (BN) and silicon nitride (SiN) are the most preferred materials for the X-ray transmitting layer and it is not concluded that gold (Au) is the best X-ray absorber and the material for the X-ray mask Recently, various proposals have been made for the problem, and it is expected that the support body will use monocrystalline silicon.