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本文用脉冲高能量密度等离子体技术,在室温条件下,成功地在GCr15钢表面沉积了性能良好的氮化钛薄膜。用自动划痕试验仪测量了氮化钛薄膜的结合强度。研究结果表明:表征薄膜结合强度的临界载荷有相当高的值;氮化钛薄膜的临界载荷随脉冲轰击次数、内外电极的电压变化而变化。对沉积膜结合强度的这些变化给予了理论上的解释与讨论。
In this paper, a pulsed high energy density plasma technique was used to deposit a good titanium nitride film on the surface of GCr15 steel successfully at room temperature. The bond strength of the titanium nitride film was measured with an automatic scratch tester. The results show that the critical load that characterizes the bonding strength of films has a very high value. The critical load of TiN films varies with the number of pulse bombardment and the voltage of the internal and external electrodes. The changes in the bond strength of deposited films are theoretically explained and discussed.