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为了满足单级衍射光栅的应用需求,在器件研制中对X射线光刻的关键技术进行优化,克服了曝光中图形畸变的问题,并利用同步辐射光源对单级衍射光栅进行了高效率的批量复制。通过对X射线光谱成分进行模拟,在X射线束线中插入铬反射镜和氮化硅滤片,得到了能量范围为0.5~2 keV的大面积均匀光斑;根据具体情况对掩模图形进行+5~+35 nm的校正,克服了X射线曝光图形扩展的问题;通过控制掩模与基片软接触产生的莫尔条纹,使曝光间隙降到3μm以下,保证了稳定的曝光结果与高分辨率;所制备的多种单级衍射光栅图形结构复杂,具有纳米尺度特征线宽,剖面陡直,满足单级衍射光栅设计对纳米加工技术的苛刻要求。
In order to meet the application requirements of single-stage diffraction grating, the key technologies of X-ray lithography are optimized in the device development, overcoming the problem of graphic distortion in exposure and using synchrotron radiation light source to efficiently batch single-stage diffraction grating copy. Through the simulation of the X-ray spectral components, a chromium mirror and a silicon nitride filter are inserted into the X-ray beam line to obtain a large area uniform light spot with an energy range of 0.5-2 keV; and the mask pattern is subjected to a + The correction of 5 ~ + 35 nm overcomes the problem of X-ray exposure pattern expansion. By controlling the Moiré fringes caused by the soft contact of the mask with the substrate, the exposure gap is reduced to below 3 μm, which ensures stable exposure results and high resolution The prepared single-stage diffraction grating has a complex structure and a nanometer-scale feature line width and steep profile, which meets the stringent requirements of single-stage diffraction grating design for nano-fabrication technology.