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一、溅射物理基础: 溅射作为原子(离子)碰撞物理过程的研究在国外近年来颇为重视。当一固体表面受到原子,离子或分子的轰击时,可以有很多现象发生,主要依赖于轰击粒子的能量。在很低的动能下(<5电子伏),相互作用主要发生在靶材料与最外表面层。这种作用可引起金属表面吸附杂质的脱附,化学键的破坏、化学反应等等。惰性气体原子可引起反射或与表面热平衡,引起蒸发动量传输等物理过程。
First, the physical basis of sputtering: sputtering as a collision of atoms (ions) physical process in recent years, considerable attention. When a solid surface is bombarded by atoms, ions or molecules, there are many phenomena that can occur, depending on the energy of the particles being bombarded. At very low kinetic energy (<5 electron volts), the interaction occurs mainly in the target material and the outermost surface layer. This effect can cause the metal surface adsorption of impurities desorption, chemical bond damage, chemical reactions and so on. Inert gas atoms can cause reflection or heat balance with the surface, causing the transfer of momentum and other physical processes.