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最近几年,在生产光学和微电子学薄膜系统中,真空淀积金属氧化物的应用有了迅速的增长。其结果是,淀积过程控制设备的发展也有了进展,用化学性质活泼的材料生产可靠的薄膜常遇到的许多困难已被克服。监视和控制金属氧化镀层的先进的系统已由English、Pntnev和Holland研究成功,其最终目的是从淀积周期中去除操作者的误差。这项工作包括了在自动控制蒸发速率的条件下、金属氧化物反应蒸发的研究和实际经验。本文详细地介绍了这项工作和获得的某些结果。也讨论了用蒸发方法真空淀积金属氧化物的历史背景和最近十年来在控制方面的某些工作。
In recent years, there has been a rapid increase in the use of vacuum deposited metal oxides in the production of optical and microelectronic film systems. As a result, progress has also been made in the development of deposition process control equipment, and many of the difficulties encountered in producing reliable films from chemically active materials have been overcome. Advanced systems for monitoring and controlling metal oxide coatings have been successfully researched by English, Pntnev and Holland with the ultimate goal of removing operator error from the deposition cycle. This work includes the research and practical experience of metal oxide reaction evaporation with automatic control of evaporation rates. This article details this work and some of the results obtained. The historical background of vacuum deposition of metal oxides by evaporation and some work on control over the last decade are also discussed.