We investigate the transient behavior of an n-type double gate negative capacitance junctionless tunnel field effect transistor(NC-JLTFET).The structure is realized by using the work-function engineering of metal electrodes over a heavily doped n~+ silicon channel and a ferroelectric gate stack to get negative capacitance behavior.The positive feedback in the electric dipoles of ferroelectric materials results in applied gate bias boosting.Various device transient parameters viz.transconductance,output resistance,output conductance,intrinsic gain,intrinsic gate delay,transconductance generation factor and unity gain frequency are analyzed using ac analysis of the device.To study the impact of the work-function variation of control and source gate on device performance,sensitivity analysis of the device has been carried out by varying these parameters.Simulation study reveals that it preserves inherent advantages of charge-plasma junctionless structure and exhibits improved transient behavior as well. We investigate the transient behavior of an n-type double gate negative capacitance junctionless tunnel field effect transistor (NC-JLTFET). The structure is realized by using the work-function engineering of metal electrodes over a heavily doped n ~ + silicon channel and a ferroelectric gate stack to get negative capacitance behavior. positive feedback in the electric dipoles of ferroelectric materials results in applied gate bias boosting. Difficult device transient parameters viz. transconductance, output resistance, output conductance, intrinsic gain, intrinsic gate delay, transconductance generation factor and unity gain frequency are analyzed using ac analysis of the device. To study the impact of the work-function variation of control and source gate on device performance, sensitivity analysis of the device has been carried out by varying these parameters. Simulation study reveals that it preserves inherent advantages of charge-plasma junctionless structure and exhibits improved transient be havior as well