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离子膏剂渗硼,是把涂覆膏状渗硼剂后的试件,在辉光放电下进行渗硼处理的新工艺。本文主要侧重于探讨渗剂的反应机理,并设计使用了一种有多个探头的特殊试样和测定了渗硼过程中膏剂内外的电位分布。实验发现,在试样上5mm厚熔融的膏剂内,存在着相对于试样40～50V的电位差。该值超过了以硼砂为基的膏剂组成物质的分解电压。根据测定和分析提出了一个由气相、液相、热分解和电解机制共同作用的离子膏剂渗硼反应模型。它可以解释该工艺比常规方法具有更高渗速的原因。
Boronizing with ionic paste is a new process for boriding the sample after gypsum-coated paste with glow discharge. This paper focuses mainly on exploring the mechanism of the permeation reagent and designing a special sample with multiple probes and determining the potential distribution inside and outside the paste during boronizing. It has been found experimentally that there is a potential difference of 40 to 50 V with respect to the sample in the 5-mm-thick paste on the sample. This value exceeds the decomposition voltage of the borax-based paste composition material. According to the measurement and analysis, a model of boronizing reaction of ionic paste by gas phase, liquid phase, thermal decomposition and electrolysis mechanism was proposed. It explains why the process has a higher rate of permeation than the conventional method.