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探讨Ni-AlN复合膜和渐变Ni-AlN选择性吸收涂层的中频溅射技术。结果表明:随着镍靶电流增加和铝靶电流减小,铝靶溅射由金属模式向反应模式转变对应的临界氮气流量降低,制备的Ni-AlN复合膜中镍含量增加,铝含量和氮/铝原子比减少,更容易产生游离铝。随着单层复合材料吸收层沉积时间的增加,Ni-AlN选择性吸收涂层由梯度渐变结构变成多层膜结构,在可见光范围的反射率降低;当单层复合材料吸收层沉积时间为10min时,Ni-AlN选择性涂层在可见光范围的反射率约为10%,具有良好的光谱选择性。
To investigate the medium frequency sputtering technology of Ni-AlN composite film and graded Ni-AlN selective absorption coating. The results show that with the increase of nickel target current and decrease of aluminum target current, the flow rate of critical nitrogen in the aluminum target sputtering decreases from the metal mode to the reaction mode. The Ni content in the prepared Ni-AlN composite membrane increases and the content of aluminum and nitrogen / Aluminum atomic ratio is reduced, more likely to produce free aluminum. With the increase of the deposition time, the Ni-AlN selective absorption coating changed from a graded gradient structure to a multi-layered film structure and the reflectivity decreased in the visible range. When the deposition time of the monolayer composite absorbent layer was At 10 min, Ni-AlN selective coating has a good spectral selectivity in the visible range of about 10%.