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用火焰水解和高温烧结的方法在单晶硅基片上制备了厚SiO2 和B2 O3 P2 O5 SiO2 光波导包层材料。并用扫描电镜 (SEM)和X射线粉末衍射 (XRD)方法对其微观形貌和物相结构进行了观察和检测。重点对硅基片上沉积厚SiO2 时的龟裂和析晶问题进行了深入研究。从扫描电镜照片可以看出 ,火焰水解法形成的SiO2 粉末呈多孔的蜂窝状结构。这种粉末具有很高的比表面积 ,因而很容易烧结成玻璃。X射线衍射图谱表明 ,这种粉末是完全非晶态的。经过烧结以后 ,从扫描电镜照片可以明显看出硅基片上的SiO2 薄膜出现龟裂。同时 ,X射线衍射测试结果表明有少量SiO2 析晶。而通过在SiO2 中掺入B2 O3 、P2 O5,上述龟裂和析晶完全消失。用这种工艺制备的SiO2 波导包层材料厚度达到 2 0 μm以上 ,表面光滑、没有龟裂 ,而且是完全玻璃态的 ,可以用于制备性能优良的各种硅基二氧化硅波导器件。
The thick SiO2 and B2 O3 P2 O5 SiO2 optical waveguide cladding materials were prepared on the monocrystalline silicon substrate by flame hydrolysis and high temperature sintering. The morphology and phase structure were observed and examined by SEM and XRD. Focus on the silicon substrate deposition of thick SiO2 cracking and crystallization problems in-depth study. It can be seen from the scanning electron micrograph that the SiO2 powder formed by the flame hydrolysis method has a porous honeycomb structure. This powder has a high specific surface area and is therefore easily sintered into glass. X-ray diffraction patterns show that this powder is completely amorphous. After sintering, it can be clearly seen from the scanning electron micrographs that the SiO2 film on the silicon substrate is cracked. At the same time, X-ray diffraction test results show a small amount of SiO2 crystallization. Through the incorporation of B2 O3, P2 O5 in SiO2, the above-mentioned cracks and crystallization disappear completely. The SiO2 waveguide cladding material prepared by the above process has a thickness of more than 20 μm, a smooth surface, no cracks, and is completely vitreous and can be used for preparing various silicon-based silicon dioxide waveguide devices with excellent performance.