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硒化锌材料具有较宽的透光区,使其在红外区有着广泛的应用,然而其作为基底,镀制超宽带增透膜却有相当大的难度,尤其是膜层强度问题。设计出了硒化锌基底上2～16μm的多层超宽带增透膜,并采用离子束辅助沉积工艺在硒化锌基底上进行了多次实验,并对所使用的氟化钇(YF_3)和硒化锌膜料进行了分析,发现YF_3在3400和1640 cm~(-1)两个波数处的吸收峰。通过将低折射率层改为氟化钡和氟化钇的组合层后,在硒化锌基底上成功镀制出了多层宽带增透膜并采用脉冲电弧离子镀技术在多层薄膜的表面镀制了一定厚度的类金刚石(DLC)薄膜,增强了膜层的强度。最终使硒化锌基底上镀制的超宽带增透膜在2～16μm范围内的平均透射比大于93%,峰值透射比大于97%,并且膜层的强度较好。
Zinc selenide material has a wide light-transmitting region, which makes it widely used in the infrared region. However, as a substrate, there is considerable difficulty in plating ultra-wideband antireflection coatings, especially the strength of the film. A multi-layer ultra-wideband AR coating with 2 ~ 16μm on ZnSe substrate was designed. Many experiments were carried out on ZnSe substrate by ion beam-assisted deposition. The YF_3 (YF_3) And zinc selenide film material were analyzed and found that YF_3 at 3400 and 1640 cm ~ (-1) two wavenumber absorption peak. By changing the low refractive index layer into a combination layer of barium fluoride and yttrium fluoride, a multilayer anti-reflection coating was successfully formed on the zinc selenide substrate and the surface of the multilayer film was coated with pulse arc ion plating Plating a certain thickness of diamond-like (DLC) film, enhanced film strength. Finally, the ultra-wideband AR coatings on the zinc selenide substrate have an average transmittance of more than 93% in the range of 2 to 16 μm and a peak transmittance of greater than 97%, and the strength of the film is better.