【摘 要】
：
Ge1Sb2Te4-based chalcogenide random access memory array, with a tungsten heating electrode of 260nm in diameter, is fabricated by 0.18-μm CMOS technology. Elec
【机 构】
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Laboratory of Nanotechnology, Shanghai Institute of Micro-System and Information Technology, Chinese
论文部分内容阅读
Ge1Sb2Te4-based chalcogenide random access memory array, with a tungsten heating electrode of 260nm in diameter, is fabricated by 0.18-μm CMOS technology. Electrical performance of the device, as well as physical and electrical properties of Ge1Sb2Te4 thin film, is characterized. SET and RESET programming currents are 1.6 and 4.1 mA, respectively, when pulse width is 100ns. Both the values are larger than those of the Ge2Sb2 Te5-based ones with the same structure and contact size. Endurance up to 106 cycles with a resistance ratio of about 100 has been achieved.
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