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研究了铜电极在含 BTA及其系列 CBTME、CBTBE三种缓蚀剂的硼砂缓冲溶液 ( p H9.2 )中的光电化学行为。当溶液中含有一定量的 BTA、CBTME和 CBTBE时 ,电位在正向扫描过程中 ,电极光响应由 p型转变为 n型。BTA的缓蚀作用优于 CBTME和 CBTBE。一定比例的 BTA和CBTME复配后对铜的缓蚀作用有协同效应。可以用光电化学方法评价铜缓蚀剂的效果。交流阻抗法测得的结果与光电化学方法相符。
The photoelectrochemical behavior of copper electrode in borax buffer (p H9.2) containing BTA and its series of CBTME and CBTBE inhibitors was studied. When the solution contains a certain amount of BTA, CBTME and CBTBE, the potential in the forward scan process, the electrode photoresponse from p-type into n-type. The corrosion inhibition of BTA is better than that of CBTME and CBTBE. A certain proportion of BTA and CBTME compound have a synergistic effect on the corrosion inhibition of copper. The effect of the copper corrosion inhibitor can be evaluated photochemically. The results of the AC impedance method are consistent with those of the photoelectrochemical method.