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利用磁控溅射的方法,在玻璃基片上制备了以不同厚度Bi作底层的FePt薄膜,然后经不同温度真空热处理,得到L10有序结构的FePt薄膜;同时,系统地研究了退火时间以及Bi底层的厚度对FePt薄膜的磁性能和微结构的影响。实验结果表明:利用Bi作底层,通过Bi原子在薄膜中的扩散作用可以有效地调控FePt薄膜的有序化程度,从而对薄膜的矫顽力进行控制;更重要的是,利用上述Bi原子对FePt原子有序化的调控作用,可以实现FePt原子的快速有序化,制备出能够快速有序的L10-FePt薄膜。
The magnetron sputtering method was used to fabricate FePt thin films with different thickness of Bi on the glass substrate and then annealed at different temperatures to obtain the L10 ordered FePt thin films. Meanwhile, the annealing time and Bi Effect of the thickness of the bottom layer on the magnetic properties and microstructure of FePt thin films. The experimental results show that the coercivity of FePt thin films can be effectively regulated by the diffusion of Bi atoms in the films by using Bi as the bottom layer, and thus the coercive force of the films can be controlled. More importantly, FePt atomic ordering regulation, can achieve rapid ordering of FePt atoms, to prepare a fast and orderly L10-FePt film.