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本文利用气相色谱法,分析六氟化钨中微量气体杂质的含量。由于六氟化钨具有很强的腐蚀性,在对其进行分析时,要对气相色谱仪进行改造。本文设计了一个反吹双通路分析系统,在六氟化钨中的气相杂质进入检测器后,可以及时地将六氟化钨反吹出去,从而既可以保证分析的准确性,又可以避免六氟化钨对仪器的腐蚀。此外,本实验还结合仪器以及被测样品本身的性质,通过正交实验确定了气相色谱仪的最佳操作参数,在此基础上,利用一系列标准气体,确定了采用不同的色谱柱进行分析时,仪器最佳的反吹时间,从而保证分析的准确性和安全性。最终可以准确地对六氟化钨中的四氟化碳、四氟化硅、二氧化碳、六氟化硫、氧气、氮气和一氧化碳等痕量的气体杂质进行分析,从而确定了对六氟化钨中气体杂质的分析方法。
In this paper, by gas chromatography, analysis of tungsten hexafluoride trace impurities in the gas content. As tungsten hexafluoride is highly corrosive, gas chromatographs should be retrofitted when analyzing it. In this paper, a two-pass backflushing system is designed. After gaseous impurities in tungsten hexafluoride enter the detector, the tungsten hexafluoride can be backflushed back in time to ensure the accuracy of the analysis and to avoid six Tungsten fluoride on the corrosion of the instrument. In addition, the experiment also combined with the nature of the instrument and the sample itself, through orthogonal experiments to determine the best operating parameters of the gas chromatograph, on this basis, the use of a series of standard gases, identified using different columns for analysis The best back-blowing time of the instrument ensures the accuracy and safety of the analysis. Finally, trace impurities such as carbon tetrafluoride, silicon tetrafluoride, carbon dioxide, sulfur hexafluoride, oxygen, nitrogen, and carbon monoxide in tungsten hexafluoride can be accurately analyzed to confirm that tungsten hexafluoride Gas impurities in the analysis.