【摘 要】
：
Al2O3/SiO2 multilayer high-reflective (HR) mirrors at 355 nm were prepared by electron beam evaporation, and post-irradiated with Ar/O mixture plasma. The surface defect density, reflective spectra, and laser-induced damage characteristics were measured u
【机 构】
：
Shenzhen Key Laboratory of Advanced Thin Films and Applications, Shenzhen University, Shenzhen 51806
【出 处】
：
武汉理工大学学报（材料科学版）（英文版）
论文部分内容阅读
Al2O3/SiO2 multilayer high-reflective (HR) mirrors at 355 nm were prepared by electron beam evaporation, and post-irradiated with Ar/O mixture plasma. The surface defect density, reflective spectra, and laser-induced damage characteristics were measured using optical microscopy, spectrophotometry, a damage testing system, and scanning electron microscopy (SEM), respectively. The results indicated that moderate-time of irradiation enhanced the laser-induced damage threshold (LIDT) of the mirror, but prolonged irradiation pro-duced surface defects, resulting in LIDT degradation. LIDT of the mirrors initially increased and subsequently decreased with the plasma processing time. SEM damage morphologies of the mirrors revealed that nanoscale absorbing defects in sub-layers was one of the key factors limiting the improvement of LIDT in 355 nm HR mirror.
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