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我们研制了一种对耐火金属硅化物,铌和二氧化硅中痕量杂质,U,Th,Ca,Fe,Cr,Ni,Cu和Cd的测定方法,即同位素稀释质谱法(IDMS),该法是借助微电子设备的特性使其对铀、钍分析检出限降到最低为ppt级的水平,对其他元素可检测到ppb级或根据空白值的某些情况而衰减的高灵敏度和高准确度的方法.痕量组分与基体分离是采用选择色谱,萃取和电解步骤与热离子化质谱结合的方法,并对先进工艺的高纯材料(金属和硅化物粉末,致密的硅化物和二氧化硅)的不同样品进行了分析.
We have developed a method for the determination of trace impurities U, Th, Ca, Fe, Cr, Ni, Cu and Cd in refractory metal silicides, niobium and silica, namely isotope dilution mass spectrometry (IDMS) Act is based on the characteristics of microelectronic devices so that uranium, thorium analysis detection limit to a minimum level of ppt level, the other elements can detect ppb level or according to the blank value of some cases of attenuation of high sensitivity and high Accuracy of the method of separation of trace components and the matrix is the use of selective chromatography, extraction and electrolysis steps and thermal ionization mass spectrometry method, and the advanced technology of high purity materials (metal and silicide powder, dense silicide and Silica) of different samples were analyzed.