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以Er3+/Yb3+掺杂的ZnO烧结陶瓷为靶材,利用射频磁控溅射技术在石英玻璃上制备了高度c轴取向的纳米Er3+/Yb3+掺杂的ZnO薄膜,利用X射线衍射、棱镜耦合、卢瑟福背散射等技术研究了所沉积薄膜的结构和光波导特性,结果表明:薄膜中均出现(002)衍射峰,且随着温度的增加,衍射峰半高宽减小,强度增大,(100)晶面逐渐消失。600℃时出现(004)晶面,薄膜的模有效折射率接近ZnO晶体的折射率。
The Er3 + / Yb3 + -doped ZnO sintered ceramics were used as targets. The high c-axis oriented Er3 + / Yb3 + -doped ZnO thin films were prepared on quartz glass by RF magnetron sputtering. X-ray diffraction, Rutherford backscattering techniques were used to study the structure and optical waveguide properties of the deposited films. The results show that the (002) diffraction peaks appear in the films, and the half-width of the diffraction peak decreases with the increase of the temperature, (100) crystal face gradually disappear. The (004) crystal plane appears at 600 ℃. The effective refractive index of the film is close to the refractive index of ZnO crystal.