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据日刊《电子展望》一九七七年七月号报导,日本超 LSI 技术研究组合共同研究所,在通产省的资助下,从去年六月开始到目前已试制成了一种新方式的电子束曝光装置。贡献于超 LSI 技术的这种“可改变尺寸矩形束电子方式”曝光装置,可对任意大小的的矩形一次曝光完毕,比靠点状电子束扫插方式,即像涂画方法的那种老式办法,扫描时间可以缩小一个数量级以上。众所周知,在以往的电子束扫描装置中,一般是用与电视机的电子束管一样的扫描方式聚焦,把一圆柱状电子束的直径聚到图形最细部分的1/4以下来进行扫描,因此,扫描一个大
According to the Japanese journal Electronic Outlook, July, 1977, the Japan Institute for Ultra LSI's Technology Research Co-Research Institute, under the auspices of the Ministry of International Trade and Development, has been experimenting with a new approach since June last year Electron beam exposure apparatus. This “resizable rectangular beam electronically” exposure device that contributes to the ultra-LSI technology enables one-time exposure of a rectangle of any size to be completed, compared with the point-like electron beam scanning method, that is, Approach, scan time can be reduced by more than an order of magnitude. It is generally known that conventional electron beam scanning devices generally focus on the same electron beam as the television tube and scan the diameter of a cylindrical electron beam to 1/4 or less the thinnest portion of the pattern, So, scan a big one