随着半导体器件向高频、大功率、低噪声方面迅速发展,集成电路向高集成度、高可靠性和高速、低功耗方面发展,这对制版的要求就越来越高了,为此不仅要求有分辨率高的镜头,还要求有分辨率较高、耐磨的掩模。目前在制造集成电路的光刻工艺中,要用一套掩模来确定光致抗蚀剂材料上的图象,以便来形成电路图形。当前一般使用的 With the rapid development of semiconductor devices in terms of high frequency, high power and low noise, the development of integrated circuits toward high integration, high reliability and high speed and low power consumption has increased the demand for plate making, Not only requires a high resolution lens, but also requires a higher resolution, wear-resistant mask. Currently in photolithographic processes for fabricating integrated circuits, a set of masks is used to define the image on the photoresist material to form a circuit pattern. Currently generally used