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自1959年集成电路发明以来，它已经对人类的生产和生活方式的很多方面产生了极其重大的影响。集成电路正以线宽每年缩小30％、集成规模增长1倍、芯片价格随之下降的惊人速度发展。光刻技术的发展始终是集成电路发展的决定因素。本文综述了深亚微米光刻和纳米光刻技术。在光学光刻部分，简要描述了光刻的历史演变，较详细综述了光学光刻的最新进展，如相移掩模、离轴照明及深紫外曝光。最后介绍了电子束曝光及X射线曝光的发展状况及SIM纳米加工的发展状况。
Since the invention of integrated circuits in 1959, it has had a very significant impact on many aspects of human production and lifestyles. ICs are shrinking 30% per year in line width, doubling the scale of integration, the alarming rate at which chip prices have dropped. The development of lithography technology has always been a decisive factor in the development of integrated circuits. This article reviews deep submicron lithography and nanolithography. In the section of photolithography, the history of photolithography is briefly described. Recent advances in photolithography are reviewed in detail, such as phase shift mask, off-axis illumination and deep ultraviolet exposure. Finally, the development of electron beam exposure and X-ray exposure and the development of SIM nanofabrication are introduced.