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使用一个聚焦染料激光系统,设计的修改可以很迅速的反应到集成电路薄膜显示的扫描机构中去。用这种技术直接在片子表向常规的光刻掩膜上扫描图形。原来的图形和不必正确的调整,记录而由对原来图形的理解所定的新的图形能同时观察到,不需产生新掩膜的装置(?)不要求一个完整的器件工艺周期而能在片子上进行修改(删去或添加线条)这一技术能用于片子上孤立的部分,如添加或改换线路,或引出作为检测用的内部试验点。下面将描述用于迅速修改集成电路设计显示装置的激光系统。
Using a focused dye laser system, the design changes can be very quickly reflected in the integrated circuit film display scanning mechanism to go. Use this technique to scan patterns directly on a sheet mask to a conventional lithographic mask. The original graphics and the new graphics that do not have to be properly adjusted, recorded, and defined by the original graphics can be observed at the same time, without the need for a new mask device (?) Does not require a complete device cycle and can be used in the film (Delete or add lines) This technique can be used on isolated parts of the film, such as adding or changing lines, or as an internal test point for testing. The laser system for rapidly modifying the integrated circuit design display device will now be described.