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Al_xO_y films by DC reactive magnetron sputtering were annealed in air ambient at 500 ℃for 1 h with different heating rates of 5,15,and 25 ℃/min.Then heat treatments at 900 ℃ were carried out on these 500 ℃-annealed films to simulate the high-temperature application environment.Effects of the annealing heating rate on structure and properties of both 500 ℃-annealed and 900 ℃-heated films were investigated systematically.It was found that distinct γ-Al_2O_3 crystallization was observed in the 900 ℃-heated films only when the annealing heating rates are 15 and 25 ℃/min.The 500 ℃-annealed film possessed the most compact surface morphology in the case of 25 ℃/min.The highest microhardness of both 500 ℃-annealed and 900℃-heated films were obtained when the annealing heating rate was 15 ℃/min.
Al_xO_y films by DC reactive magnetron sputtering were annealed in air ambient at 500 ° C for 1 h with different heating rates of 5,15, and 25 ° C / min. Heat treatment at 900 ° C were carried out on these 500 ° C -annealed films to simulate the high-temperature application environment. Effects of the annealing heating rate on structure and properties of both 500 ° C. -analed and 900 ° C. -heated films were investigated systematically. It was found that distinct γ-Al 2 O 3 crystallization was observed in the 900 ° C.- heated films only when the annealing allowances are 15 and 25 ° C./min., 500 ° C. -annealed film possessed the most compact surface morphology in the case of 25 ° C./min., the highest microhardness of both 500 ° C. -annealed and 900 ° C.- heated films were obtained when the annealing heating rate was 15 ° C / min.