在光学薄膜越来越广泛使用的今天,高精度红外滤光片的研制及高质量成批的薄膜元件的生产与制备过程中诸工艺控制参数的关系日益受到重视。材料的淀积速率和基片温度是影响光学薄膜折射率的两个极为重要的参数,然而这些参数的精确测量和实时控制在技术上一直没有很好解决。随着石英晶体技术和微计算机的发展,监控技术出现了新的局面。本文介绍的淀积速率控制系统是“高精度红外膜厚监控技术和方法研究”中的一个课题。我们研制了运用石英晶体和微机技术的速率控制装置完成了原理性实验,获得了预期的阶段性成果,为进一步研究积累了经验。 In the increasingly wide use of optical films today, the relationship between the development of high-precision infrared filters and the process control parameters in the production and preparation of high-quality batched thin-film elements is gaining more and more attention. Material deposition rate and substrate temperature are two very important parameters that affect the refractive index of optical films. However, precise measurement and real-time control of these parameters have not been solved technically. With the quartz crystal technology and the development of microcomputer, monitoring technology has emerged a new situation. The deposition rate control system introduced in this paper is a topic in “Research on High-precision Infrared Film Thickness Monitoring Techniques and Methods”. We developed a rate control device using quartz crystal and microcomputer technology to complete the principle experiment, obtained the expected stage results, and accumulated experience for further research.