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本文用双靶相对磁控溅射法(FTMS)在1.2Pa至26.6Pa气压范围原位制备高温超导YBa2Cu3O7-б薄膜,重点研究了溅射气压和功率与双靶间距和衬底位置之间的相关性.结果表明,为制备高质量超导薄膜,在不同的溅射气压下,存在不同的靶一衬底最佳几何配置,溅射薄膜的组分、性能和溅射粒子的空间分布亦取决于这些参数的选取.
In this paper, a high-temperature superconducting YBa2Cu3O7-б thin film was prepared in-situ by double-target relative magnetron sputtering (FTMS) at a pressure range of 1.2Pa to 26.6Pa. The effects of sputtering pressure and power, twin target spacing and substrate location The correlation between. The results show that there exist different optimal target geometries for target substrate in order to prepare high quality superconducting thin films. The composition and properties of sputtered films and the spatial distribution of sputtered particles also depend on these Parameter selection.