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介绍了脉冲激光沉积薄膜技术的原理、特点,详细探讨了脉冲激光沉积的研究动态和发展趋势。大量研究表明,PLD 技术是目前制备薄膜的最好方法之一。
The principle and characteristics of pulsed laser deposition thin film technology are introduced. The research trends and development trend of pulsed laser deposition are discussed in detail. A large number of studies have shown that, PLD technology is currently one of the best method of preparation of the film.